China’s Jack unveils three high-tech sewing machines in Egypt
Photo Courtesy: Jack website
Jack Sewing Machine Co. Ltd., a leading Chinese sewing machinery manufacturer, has recently launched three new cutting-edge sewing technologies including lockstitch and overlock machines, suitable for the Egyptian market.
The unveiled machines include three models A3, A4S (both computerized lockstitch machines), and C3 which is a high-speed automatic overlock machine.
Betty, Director, Africa Region and Egyptian Liaison office, Jack, told Apparel Resources exclusively that the machines were launched during Jack’s service center opening ceremony in Egypt which recently took place at Hilton Hotel and expressed the support and gratitude towards its Egyptian customers.
One of the newly launched machines, A3, is a high-speed computerized lockstitch machine which can smoothly sew any type of fabric from light weight fabric such as gauze to heavy weight fabric like denim. The sewing machine operates at a high speed of 5000 SPM. It is worth noting that the machine is equipped with unique functions like a half stitch, reverse stitch and LED lamp which gives a better sewing experience.
On the other hand, A4S is semi-dry automatic lockstitch machine and comes equipped with a unique oil lubrication system which is integrated into the machine head so as to prevent any oil leakage and oil staining. It is incorporated with a new function for oil level reminding and thread taking up the system with DLC needle bar and bearing that makes it durable.
The third machine C3 comes studded with an auto thread trimmer and auto presser lifter. It is equipped with distinctive features including oil-proof needle bar, one key reset and single shaft drive for stable and fast operation. Moreover, the machine runs at a maximum speed of 5800 SPM and it is compatible with heavy and medium materials.
The ceremony witnessed the presence of Mohamed Abdel Salam, Chairman of the Egyptian Garment Association who acknowledged Jack’s development in the Egyptian market.
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